Coherent spin field effect transistor

ABSTRACT

A coherent spin field effect transistor is provided by depositing a ferromagnetic base like cobalt on a substrate. A magnetic oxide layer is formed on the cobalt by annealing at temperatures on the order of 1000° K to provide a few monolayer thick layer. Where the gate is cobalt, the resulting magnetic oxide is Co 3 O 4  (111). Other magnetic materials and oxides may be employed. A few ML field of graphene is deposited on the cobalt (III) oxide by molecular beam epitaxy, and a source and drain are deposited of base material. The resulting device is scalable, provides high on/off rates, is stable and operable at room temperature and easily fabricated with existing technology.

This application is a divisional of application Ser. No. 13/343,970,filed Jan. 5, 2012, pending, which is incorporated by reference herein.

The subject matter of this patent application was developed withoutfederal or state funding. Although both inventors named herein are thebeneficiaries of support from various corporate organizations, and areemployed by Universities at which they work on subject matter includingthe development and characterization of materials formed by the directgrowth of graphene on various substrates, no University time,compensation or apparatus was employed, involved or relied on in thedevelopment of the subject matter disclosed and claimed herein.

BACKGROUND OF THE INVENTION

Field of the Invention

The present invention relates to the development of a non-local spinvalve, sometimes referred to as a spin field effect transistor, orspin-FET. Spin-FETS that can be operated at ambient temperatures offerthe advantages of greater data storage in less space, with a reducedpower consumption, and high sensitivity. Spin-FETS offer non-volatilesolid state data storage the does not require the constant applicationof current to sustain it. Spin-FETS are, accordingly, an attractivetechnology to be used in the development of Magnetic Random AccessMemory, or MRAMs. Spin-FETS also find application in logic devices, orcombined logic and spin devices. Richter et al, Appl. Phys. Lett., 801291 (2002). Among the least consequential, but easily understood,effects of such advances is the ability to provide computing deviceswhich need not consult a stored database before uploading, as mostpersonal computers are arranged today. They offer an “instant on”capability: that is to say, nonvolatile memory and logic.

Background of the Technology

The spin-FET may have been first described as a desirable device toconstruct in 1990 (Datta et al, Appl. Phys. Lett., 56, 665 (1990)).These devices contemplate a non-magnetic layer which is used fortransmitting and controlling the spin polarization of electrons fromsource to drain. A variety of field materials have been proposed overthe years. Most of the concentrated effort in this field has looked atspin injection as a means of arriving at the capabilities offered by thetheoretical spin-FET as described. Notwithstanding this effort, no roomtemperature spin-FET, that is scaleable, and reliable at low powerconsumption has yet been provided.

In one approach, the ability to deposit thin layers of cobalt onsemi-conducting substrates such as GaAs was developed, in an effort toprovide for a controlled magnetization perpendicular to the substrate.Bournel et al, Physics E, 10, 86-90 (2001). Ultimately, theseresearchers were unable to secure a stable, perpendicular magnetizationfor a ferromagnetic/semiconductor contact field, but research diddemonstrate the ability to grow thin layers of oxidized Co onsemiconductors such as gallium arsenide and silicon. As investigationsinto the provision of spin-FETs continue, the ability to adapt theresulting technology to existing materials will become increasinglyimportant.

SUMMARY OF THE INVENTION

Our invention resides in a new type of non-local spin valve or spinfield effect transistor (spin-FET), based upon graphene depositeddirectly onto a magnetically polarizeable electrically insulating orsemiconducting substrate such as an oxide, and with the oxidedielectric, with net interface spin polarization, formed on top of abase ferromagnetic layer. In essence, the polarization of the substratewill result in polarization of the transition metal ions of the oxidedielectric at both the top and bottom interfaces, which will in turnlead to polarization of the graphene valence/conduction band electrons.Using appropriate magnetically polarizable source and drain electrodes,a low power, high on-off rate spin-FET can be constructed gated by thebottom base ferromagnetic layer, separated from what amounts to a narrowconduction channel by a dielectric oxide. An example of this is shown inFIG. 1.

In developing this new or non-local spin-FET, although the applicants donot wish to be bound by this explanation, ferromagnetic polarization ofthe base layer, or gate, is effective to polarize the metal ions in themagnetic oxide at both the top and bottom interfaces. At the topinterface, the one in intimate contact with the graphene conductionchannel, these ions will undergo exchange interactions with the graphenevalence/conduction band electrons. Such “proximity polarization” hasbeen predicted for graphene [1]. Strong ion/conduction electron exchangeinteractions have been observed in impurity-doped oxide quantum dots,resulting in magnetic behavior in closed shell systems [2-4].

In elementary terms, in FET operation, when the polarization of thesource and drain are in the same direction as that of the graphene,there will be a low non-local resistance (high current) between thesource and drain. Switching the polarization of the base layer (or gate)will change the polarization of the graphene, and if it no longermatches the polarization of the source or drain, the non-localresistance will be much higher. This provides the basis for thenon-local spin-valve, or coherent spin-FET.

In a “conventional” graphene-based spin valve (FIG. 2), as demonstratedby Tombros, et al, [5], and by Cho, et al. or Han, et al [6, 7] grapheneinjection from a polarized electrode occurs through a tunneling barrier,such as alumina or magnesia [8]. The electrons are polarized by anexternal applied magnetic field as they travel through the graphene. Thespin density is thus characterized by classical diffusion kinetics,based on the long spin diffusion length of graphene [5], and limited bythe grain boundary density of graphene, and also (in the case of SiO₂)by silica/graphene phonon interactions that limit the electron mobility[5, 9]. For these reasons—substrate phonon interference andgrain-boundary densities, the performance (i.e., non-local resistance)of conventional graphene-based spin valves at room temperature has beendisappointingly poor for practical device applications. [5-7].

In contrast, the inventive coherent spin-FET's properties derive fromthe fact that magnetic exchange interactions between oxide conductionelectrons and oxide cations will result in the formation of magneticpolarons (FIG. 3a ), as shown, which are stabilized relative to theground state by ion/conduction electron exchange interactions (FIG. 3b). Since in this case the conduction band wavefunction itself ispolarized, rather than individual electrons, we term such spin transportas coherent. Thus, magnetic polaron transport in graphene should berelatively independent of graphene grain boundary density. Further, suchexchange interactions persist to and above room temperature, as thereare relatively few avenues for spin relaxation and other phonon-mediateddecay pathways. Further, if the ferromagnetic gate retains polarizationat or above room temperature, no applied external magnetic field will berequired to maintain polarization of graphene electrons, as the deviceshould operate at remanance.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are incorporated herein and constitutepart of this specification, illustrate exemplary embodiments of theinvention, and, together with the general description given above andthe detailed description given below, serve to explain the features ofthe invention.

FIG. 1 is schematic of a proposed non-local Spin Field Effect Transistor(spin-FET), based on direct graphene growth on a magneticallypolarizable oxide.

FIG. 2 is a graphene-based non-local spin valve based on diffusion ofindividual spin-polarized electrons through the graphene layer. (FromTombros, et al.)

FIG. 3 is schematic illustration of magnetic polaron formation: (a)Alignment of graphene conduction band electrons with Co⁺² ions yieldspolarization of the conduction electrons by; (b) formation of a magneticpolaron, stabilized by the exchange interactions; and (c) spin-fieldeffect transistor (spin-FET) geometry for testing this effect, whichoffers a low current, high on/off ratio non-local resistance even at 300K.

DETAILED DESCRIPTION OF THE INVENTION

Referring initially to the schematic illustration in FIG. 1, andrecognizing that this is a “conventional representation” and thatstructure and dimensions will be subject to modification depending onthe ultimate application envisioned, the formation of each layer of thecoherent spin-FET of the invention is described. This is best begun witha discussion of the field itself, as shown.

Graphene—this film must consist of (111)-oriented, sp² carbon(graphene), as either a single layer or several layers, as desired tocontrol potential oxide/graphene interactions such as charge transfer[10, 11]. This layer can be deposited by molecular beam epitaxy, orpossibly by chemical or physical vapor deposition.

The deposition of graphene on a substrate has been described at somelength in U.S. patent application Ser. No. 12/543,053 and U.S. patentapplication Ser. No. 12/980,763, both of which are includedherein-by-reference. Additional advances in the control over few layergraphene deposition are provided in U.S. Provisional Patent

Application Ser. Nos. 61/490,650 and 61/497,971, both of which areincorporated herein-by-reference. The controlled direct growth ofgraphene by MBE (layer-by-layer growth of macroscopically continuousgraphene sheets on Co₃O₄(111) at 1000 K by carbon molecular beam epitaxy(MBE) from a graphite rod source) is described in detail in U.S.Provisional Patent Application Ser. No. 61/522,600. The disclosure ofthis pending application is incorporated herein-by-reference. Any of themethods described in the incorporated applications can be used to formthe graphene field, with a preference for controlled molecular beamepitaxy.

Magnetic Oxide, Source and Drain: This material electrically isolatesthe graphene from the ferromagnetic gate layer, and allows polarizationof the graphene valence/conduction electrons via polarization of thecations in the magnetic oxide. Potential candidates include Co₃O₄(111),Fe₃O₄(111), NiO(111), and potentially spinels such as CoFe₂O₄(111), aswell as Cr₂O₃(111), BaFe₂O₄. A critical feature is the polarizationwithin the ion layer adjacent to the graphene (FIG. 1). The polarizationof the ions must be ferromagnetic within each layer, even if adjacention layers in the oxide are polarized antiferromagnetically to eachother. A uniform ferromagnetic polarization within the surface layer isneeded to polarize the graphene electrons. Further, the direction ofpolarization is important. If the oxide ions are polarized in adirection parallel to the surface plane, then the graphene will besimilarly polarized, and so must the source and drain. In that case,appropriate source/drain materials could be Co, Ni, Fe, or variousalloys. However, if the oxide cations are polarized perpendicularly tothe surface plane, then the source and drain should have easy axes ofmagnetization perpendicular to the plane, and should be made ofmaterials such as Permalloy, Co—Pd alloys and multilayers, Co—Pt alloysand multilayers, Fe—Pt alloys and multilayers, some L1o ferromagneticcompounds, etc. Similar nickel-iron alloys, and triblends, such asMolybdenum permalloy, may also be used.

Note, since NiO(111) has the same rocksalt structure as MgO(111),deposition of graphene may result in oxide reconstruction, destroyingthe chemical equivalence of graphene A sites and B sites [12], removingthe HOMO/LUMO equivalence at the Dirac point and opening a band gap, asset forth in U.S. patent application Ser. No. 12/980,763. Development ofbandgap potential in graphene bearing materials may provide importantelectronic advantages, in addition to preserving spintronicadaptability.

Ferromagnetic Gate: This layer should have its axis of magneticpolarization that is easily switchable and ideally has a low coercivefield for multifunction logic gates, and be ferromagnetic at roomtemperature. Appropriate materials include Co, Ni, or Fe.

EXAMPLE

In order to prepare a coherent spin-FET of the invention, a sapphire(aluminum oxide (0001)) substrate is prepared for deposition. Anelectron beam evaporator may be used to reduce movement between chambersand improve productivity, switching in various targets for deposition.Thus, a fifty angstrom layer of cobalt may be deposited underconventional conditions on the substrate at 750° K in UHV. Thisdeposition is followed by an oxidation anneal at 1000° K which resultsin surface segregation of dissolved oxygen and the development of a thinlayer of Co₃O₄ (111) (may be 2-5 ML thick). Graphene (2 or 3 ML) isdeposited on the Co₃O₄ using molecular beam epitaxy at 1000° K, yieldinga macroscopically continuous graphene film of approximately 3 MLthickness. Graphene may also be deposited via CVD and PVD processes, asdisclosed, but MBE is preferred, not only because of the fine controland developed information for this method, but because it is compatiblewith the other process steps in the formation of the coherent spin-FETof the invention. This leads to high productivity.

In this example, the coherent spin-FET is finished with the applicationof Co source and drain, and connected in the device for use. Onmagnetization, it is stable and exhibits a very high on/off rate withlow power consumption at temperatures substantially above roomtemperature. Thus, referring to FIG. 1, the coherent spin-FET preparedhas a gate of cobalt, with an insulating layer of cobalt oxide (Co₃O₄).A few ML layer of graphene is deposited over the magnetic oxide, with Cosource and drain. Application of a field to the device gives a durable,low power, high on/off rate spin-FET that is operable at roomtemperature. The resulting coherent spin-FET gives on/off rates (orswitching rates) of at least 10⁷-10⁸ per second depending on thematerials and conditions selected.

REFERENCES

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While the present invention has been disclosed both generically and withreference to specific embodiments and examples, these alternatives arenot intended to be limiting unless reflected in the claims set forthbelow. The invention is limited only by the provisions of the claims,and their equivalents, as would be recognized by one of skill in the artto which this application is directed.

What is claimed is:
 1. A method of forming a coherent spin field effect transistor (spin-FET), comprising a cobalt base layer or gate, a cobalt oxide layer overlaying said base layer, a layer of graphene deposited over said magnetic oxide layer, a separated source and drain both in electrical contact with said graphene layer, wherein polarization of ions in layers within said magnetic oxide layer overlaying said base layer and adjacent said graphene layer is ferromagnetic within the layers comprising: (A) forming said gate layer by deposition of said cobalt, followed by annealing to segregate surface oxygen to form a few monolayer thick cobalt oxide layer; and (B) depositing said graphene layer on said cobalt oxide layer by one or more of molecular beam epitaxy (MBE), chemical vapor deposition (CVD) and powder vapor deposition (PVD) and thereafter forming said source and drain on said graphene.
 2. The method of claim 1, wherein said gate layer is comprised of cobalt deposited at 750° K in HUV and said gate layer is annealed at 1000° K in HUV to form said magnetic oxide layer.
 3. The method of claim 1, wherein said graphene layer is formed by MBE conducted at 1000° K in HUV.
 4. A method of forming a coherent spin field effect transistor (spin-FET), comprising a ferromagnetic base layer or gate, a magnetic oxide layer overlaying said base layer, a layer of graphene deposited over said magnetic oxide layer, and an electrical contact with said graphene layer, said method comprising: (A)forming said gate layer of cobalt, (B) forming said magnetic oxide of chrome oxide on said gate layer, (C) depositing said graphene layer over said chrome oxide and annealing said graphene layer, and (D)forming an electrical contact with said annealed graphene.
 5. The method of claim 4, wherein said graphene is deposited by molecular beam epitaxy (MBE), chemical vapor deposition (CVD) or plasma vapor deposition (PVD).
 6. The method of claim 5, wherein said graphene is deposited using MBE. 